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Silicon Dioxide (SiO₂): Ideal for brittle materials like glass and ceramics
distortion-free results
and excellent heat resistance under continuous use
enhancing blades life and improving operator comfort
8" Grooved Polyurethane Cerium Oxide Polishing Pad – Glass & Mirror Finishing Buffing Wheel 5 inch diamond grinding disc Silicon Dioxide (SiO₂): Ideal forThe LP 66 polyurethane cerium oxide polishing pads are engineered for professionals in lapidary optics, semiconductor, and glass manufacturing who demand uncompromising performance and sub micron precision. Constructed from hydrophobic polyurethane and infused with cerium oxide, the LP 66 Pad delivers rapid material removal while maintaining ultra low friction and heatideal for polishing heat sensitive materials like optical lenses, LCD substrates,
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